Applied to ASML, NIKON, CANON and SMEE scanner.

Lithography machines have strict micro vibration and stiffness requirements for their foundation, as well as high-precision installation and fixation requirements. The high-stiffness RC structure is employed to attain optimal vibration isolation effects. Precisely machined special components are utilized for positioning fixation parts. The surface of the RC foundation is treated with epoxy resin approved for cleanroom use. Its smoothness complies with cleanroom standards, while its stiffness satisfies the  lithography machine’s specifications.